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"Trends in State-of-the-Art Microscopy and Nanoscale Characterization" -- Edward Principe, Application Development Manager, Carl Zeiss SMT, Inc.

Wednesday, September 12, 2007
  • Seated dinner served at 6:30 ($25 if reserved by Sept. 10; $30 after & at door; vegetarian available)

  • Presentation (no cost) at 7:30.

    Ramada Inn

  • 1217 Wildwood Ave (Fwy 101 frontage road, between Lawrence Expressway and Great America Parkway), Sunnyvale, (800) 888-3899 -- see map.

    PLEASE RESERVE IN ADVANCE --

  • For dinner and/or meeting: by email to Janis Karklins
  • Please reserve for "presentation-only", even if not attending the dinner.

    OVERVIEW:
    Advances in analytical equipment and characterization techniques have gone hand-in-hand with advancements in electronics. As we push the limits of technology so must we push the limits of characterization in order to verify or even understand what we’ve created, as well as to gain a deeper understanding of new phenomena. Innovations in the science of microscopy and spectroscopy techniques happening today are coupled to intensive computational methods for design, data analysis and control of characterization platforms operating with low noise, high speed and high stability state-of-the-art electronics. The latest technology is thus an enabler for the evolution of the most advanced characterization methods which in turn are employed to drive the technology and basic science of the next generation.

    While bridging with the theme of enabling technologies; we’ll provide an overview of current and future trends in microscopy and characterization methods that are pushing the boundary even beyond the nanoscale. Topics will include helium ion microscopy, a new form of microscopy that is redefining limits in secondary imaging and revealing new contrast mechanisms with benefits in materials analysis and metrology. Atom probe spectroscopy is another rapidly maturing technology allowing perhaps the ultimate in atomic scale elemental analysis on both conductors and insulators over volumes that now encompass an entire device. The trend toward lower voltage aberration corrected TEM (and even SEM) also has broad consequences for both imaging and analysis not only in materials science but in biological studies via technologies like Boersch phase plates. Hardware miniaturization through microfabrication is allowing commercial production of table-top SEM platforms with unprecedented capabilities which is an exciting trend also due to the accessibility it may allow to future educators and technologists. Finally, the hybrid platform of a focused ion beam (FIB) and SEM can extend state-of-the-art imaging and analytical methods into the third dimension via 3D reconstruction techniques such as FIB-EBSD and FIB-SEM to provide nanoscale resolution throughout the volume of a structure or device. The FIB-SEM platform is also a primary tool for nanopatterning, nanofabrication and prototyping. In the end it is hoped you’ll not only be current on some of the latest trends in microscopy and characterization but have a renewed appreciation for the wonder of what we are able to visualize in the world around us.

    Speaker Biography:
    Edward L. Principe is the Application Development Manager within the Nanotechnology Systems Division of Carl Zeiss SMT, Inc. He received his Ph.D. in Engineering Science from The Pennsylvania State University with research in the development of corrosion resistant thin films. Before joining Carl Zeiss, Principe was a Member of Technical Staff at Applied Materials working on process development and materials characterization across a broad range of semiconductor processes. He also worked as a staff scientist at Charles Evans & Associates (now Evans Analytical Group) specializing in XPS and Auger spectroscopy. His current work includes the development of 3D metrology, automated sample processing and 3D nanofabrication. He received the ISTA/EDAS Outstanding Paper Award in 2005 and the Microscopy and Microanalysis Best Paper Award in 2003. In addition he has authored two test chapters on FIB applications and more than 20 journal publications.


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